Cathodic Arcs [electronic resource] : From Fractal Spots to Energetic Condensation / by AndrȨ Anders.

Por: Anders, AndrȨ [author.]Tipo de material: TextoTextoSeries Springer Series on Atomic, Optical, and Plasma Physics, 50Editor: New York, NY : Springer New York : Imprint: Springer, 2008Descripción: XVIII, 544 p. online resourceTipo de contenido: text Tipo de medio: computer Tipo de portador: online resourceISBN: 9780387791081Trabajos contenidos: SpringerLink (Online service)Tema(s): Physics | Chemical engineering | Plasma (Ionized gases) | Condensed matter | Surfaces (Physics) | Physics | Atoms, Molecules, Clusters and Plasmas | Industrial Chemistry/Chemical Engineering | Surfaces and Interfaces, Thin Films | Condensed MatterFormatos físicos adicionales: Sin títuloRecursos en línea: de clik aquí para ver el libro electrónico
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Springer eBooksResumen: Cathodic Arcs: From Fractal Spots to Energetic Condensation is the first book in over a decade dedicated to the physics and technology of cathodic arcs. It includes a detailed account of arc history, a textbook-like introduction to cathode phenomena, and some basic physics of expanding plasmas; it deals with the infamous macroparticle issue and describes a host of practical plasma filter solutions. In contrast to previous books on cathodic arcs, the focus is on the relation of arc plasmas and their properties to surface modification and thin film deposition. The book contains sections on basic plasma physics and thin film materials science. It also deals with practical issues of coatings such as stress control and the often-underrated issue of the coatings color. By stressing the fractal nature of cathode spots, the theme of fluctuations can be found throughout the book: fluctuations affect all plasma properties and thereby have consequences for plasma-based surface modifications and film growth. Detailed explanations are complemented by compilations of plasma and materials data arranged in Periodic Tables. Cathodic Arcs: From Fractal Spots to Energetic Condensation is written with researchers and advanced students in the fields of materials science and plasma physics in mind. It is suitable both as a reference work for the expert as well as an introduction for newcomers to the interdisciplinary fields of plasma-surface interaction and plasma-assisted deposition of thin films.
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A Brief History of Cathodic Arc Coating -- The Physics of Cathode Processes -- The Interelectrode Plasma -- Cathodic Arc Sources -- Macroparticles -- Macroparticle Filters -- Film Deposition by Energetic Condensation -- Reactive Deposition -- Some Applications of Cathodic Arc Coatings.

Cathodic Arcs: From Fractal Spots to Energetic Condensation is the first book in over a decade dedicated to the physics and technology of cathodic arcs. It includes a detailed account of arc history, a textbook-like introduction to cathode phenomena, and some basic physics of expanding plasmas; it deals with the infamous macroparticle issue and describes a host of practical plasma filter solutions. In contrast to previous books on cathodic arcs, the focus is on the relation of arc plasmas and their properties to surface modification and thin film deposition. The book contains sections on basic plasma physics and thin film materials science. It also deals with practical issues of coatings such as stress control and the often-underrated issue of the coatings color. By stressing the fractal nature of cathode spots, the theme of fluctuations can be found throughout the book: fluctuations affect all plasma properties and thereby have consequences for plasma-based surface modifications and film growth. Detailed explanations are complemented by compilations of plasma and materials data arranged in Periodic Tables. Cathodic Arcs: From Fractal Spots to Energetic Condensation is written with researchers and advanced students in the fields of materials science and plasma physics in mind. It is suitable both as a reference work for the expert as well as an introduction for newcomers to the interdisciplinary fields of plasma-surface interaction and plasma-assisted deposition of thin films.

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